Photoresist Direct Write Lithography System
SAM.GOV Due: July 3, 2025 at 08:00 PM UTC
In-Active Combined Synopsis/Solicitation SBA Source Url

Summary

The opportunity involves the procurement of a Photoresist Direct Write Lithography System, which is intended for installation at the Naval Research Laboratory in Washington, DC. This system is crucial for advanced lithography applications, requiring a vendor capable of providing a tool that meets specific technical and performance standards outlined in the solicitation. The work includes installation in a cleanroom environment, ensuring compatibility with existing utilities, and providing a system that can handle various substrate sizes and resolutions. Contractors with expertise in manufacturing and installing sophisticated lithography equipment, particularly those classified as small businesses, are encouraged to bid on this opportunity.
Description

Amendment 0001 is hereby issued to accomplish the following:

1. Provide responses to questions received. 

2. All other terms and conditions remain unchanged. 

This Request for Quote (RFQ) is for the procurment of a Photoresist Direect Write Lithography S

Entities
DOD
Department of Defense
DOTN
Department of the Navy
NAICS
333242
Set Aside
SBA : Total Small Business Set-Aside (FAR 19.5)
Place of Performance
Point of Contact
Full Name Email Phone Type
Tamara Jenkins [email protected] 2029231516 primary
ARTHUR REGO [email protected] secondary
Attachments
  • SF+1449+-+N0017325Q0006_TJ+03+June+2025.pdf
  • Attachment+1+-Specifications+Updated+30+May+2025.pdf
  • Questions+and+Answers_N0017325Q0006_NRL+Response.pdf
  • N0017325Q0006-Amendment+0001.pdf